Chemical Vapor Deposition (CVD) and Metal Organic Vapor Deposition (MOCVD) CVD and MOCVD refer to the deposition of a solid material on a substrate by means of a chemically generated vapor that reacts or breaks down chemically on the substrate to form the sought surface layer. TSMT has been involved in CVD/MOCVD depositions on metals and semiconductor substrates. Examples are illustrated in the accompanying photographs. Steel die coated with a TiN/TiC coating to minimize die wear in the production of aluminum extrusions. The die surface shows insignificant mechanical wear after hundreds of aluminum bar extrusions.